This inventor holds 1 USPTO granted patent. Top assignees: Duke University, Mcnc. Active years: 1995.
Company Filing History:
1 out of 2,075 
1 out of 96 
Years Active: 1995
Title: Teh Y Tan: Innovator in Metal-Disilicide Technology
Introduction
Teh Y Tan is a notable inventor based in Chapel Hill, NC (US). She has made significant contributions to the field of semiconductor technology, particularly in the formation of metal-disilicide layers and contacts. Her innovative methods have implications for enhancing the performance of electronic devices.
Latest Patents
Teh Y Tan holds a patent for a method of forming metal-disilicide layers and contacts. This patent describes a process that begins with a silicon-on-insulator (SOI) substrate, which includes an insulating underlayer and a silicon outer layer. The method involves the formation of a first capping layer on a portion of the silicon outer layer, preferably using titanium and a preselected metal such as cobalt. A rapid thermal annealing step is then performed to convert a portion of the silicon outer layer to metal-disilicide. Following this, a second capping layer is formed on the metal-disilicide layer, which also includes titanium and metal-monosilicide. The process ensures that the conversion of the silicon outer layer to metal-disilicide occurs without phase-reversal of the already formed layer. This innovative method is particularly useful for creating low-resistance metal-disilicide contacts in active regions of SOI electronic devices.
Career Highlights
Throughout her career, Teh Y Tan has worked with prestigious institutions such as Duke University and MCNC. Her work in these organizations has allowed her to develop and refine her innovative techniques in semiconductor technology.
Collaborations
Teh Y Tan has collaborated with notable individuals in her field, including Gary Elder McGuire and William Thomas Lynch. These collaborations have contributed to her success and the advancement of her research.
Conclusion
Teh Y Tan's contributions to the field of semiconductor technology through her innovative methods for forming metal-disilicide layers and contacts highlight her role as a significant inventor. Her work continues to influence the development of electronic devices, showcasing the importance of innovation in technology.