Ted Liang

Title: Ted Liang: Innovator in Electron Beam Technology

Introduction

Ted Liang is a prominent inventor based in Sunnyvale, California. He has made significant contributions to the field of electron beam technology, holding a total of four patents. His work primarily focuses on methods for repairing and inspecting masks used in various applications.

Latest Patents

One of Ted Liang's latest patents is titled "Method of repairing an opaque defect on a mask with electron beam-induced chemical etching." This invention discloses a method for fabricating and repairing a mask without causing damage. The apparatus includes a holder to mount a substrate, a stage to position the holder in a chamber, a pumping system to evacuate the chamber, an imaging system to locate an opaque defect in the substrate, a gas delivery system to dispense a reactant gas towards the defect, and an electron delivery system to direct electrons towards the opaque defect. Another notable patent is the "Method to inspect patterns with high resolution photoemission." This method involves inspecting a patterned surface using photoemission of electrons, which includes selecting materials of the patterned surface, choosing a light source to produce a difference in yield of photoelectrons, applying light to the patterned surface, detecting the emission of photoelectrons, and inspecting the surface based on the detected emissions.

Career Highlights

Ted Liang is currently employed at Intel Corporation, where he continues to innovate and develop new technologies. His work at Intel has positioned him as a key player in advancing electron beam applications.

Collaborations

Throughout his career, Ted has collaborated with notable colleagues, including Alan R. Stivers and Pei-yang Yan. These collaborations have contributed to the success of his projects and the advancement of technology in his field.

Conclusion

Ted Liang is a distinguished inventor whose work in electron beam technology has led to significant advancements in the industry. His innovative patents and contributions to Intel Corporation highlight his expertise and commitment to technological progress.