Company Filing History:
Years Active: 1999
Title: Te-Chuan Liao: Innovator in Semiconductor Manufacturing
Introduction: Te-Chuan Liao is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent. His work is instrumental in advancing technologies that are crucial for integrated circuits.
Latest Patents: Te-Chuan Liao holds a patent for a "Manufacturing method of double spacer structure for mixed-mode IC." This patent outlines a method for forming a double spacer structure, which involves several steps. First, a semiconductor substrate with a first and second gate is provided. The second gate has a greater length than the first gate. A first insulating layer is then formed over the substrate and gates. Following this, a photoresist layer is applied over the first insulating layer above the second gate, exposing the first insulating layer above the first gate. A first etching operation establishes a first spacer structure along the sidewalls of the first gate. After removing the photoresist layer, a second insulating layer is formed, and a second etching operation establishes a second spacer structure along the sidewalls of the second gate. This process results in a second spacer that has a width greater than the first spacer.
Career Highlights: Te-Chuan Liao is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to focus on innovative manufacturing techniques that enhance the performance and efficiency of integrated circuits.
Collaborations: Te-Chuan collaborates with talented colleagues, including Meng-Jin Tsai and Cheng-Han Huang. Their combined expertise contributes to the advancement of semiconductor technologies.
Conclusion: Te-Chuan Liao's contributions to semiconductor manufacturing through his innovative patent demonstrate his commitment to advancing technology in this critical field. His work continues to influence the development of integrated circuits, showcasing the importance of innovation in the industry.