Tatsuya Yotsutani

Title: Tatsuya Yotsutani: Innovator in Semiconductor Manufacturing

Introduction

Tatsuya Yotsutani is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 3 patents. His work focuses on innovative techniques that enhance the efficiency and effectiveness of semiconductor device production.

Latest Patents

Yotsutani's latest patents include a method of manufacturing semiconductor devices and a non-transitory computer-readable recording medium. The first patent describes a technique capable of removing by-products before they are deposited to an exhaust part. This method involves processing a substrate while maintaining an inner pressure of a process chamber, adjusting the pressure, and supplying a predetermined gas to bypass the process chamber. The second patent outlines a technique for forming an oxynitride film on substrates through a cycle that includes supplying a precursor, an oxidizing agent, and a nitriding agent, while controlling the flow rate of an inert gas to adjust the nitrogen concentration and refractive index of the film.

Career Highlights

Throughout his career, Tatsuya Yotsutani has worked with prominent companies in the semiconductor industry, including Kokusai Electric Corporation and Hitachi Kokusai Electric Inc. His experience in these organizations has allowed him to develop and refine his innovative techniques in semiconductor manufacturing.

Collaborations

Yotsutani has collaborated with notable colleagues such as Naonori Akae and Hideki Horita. These partnerships have contributed to the advancement of his research and the successful implementation of his patented technologies.

Conclusion

Tatsuya Yotsutani is a distinguished inventor whose work in semiconductor manufacturing has led to valuable innovations. His patents reflect a commitment to improving production processes and enhancing the quality of semiconductor devices.