Company Filing History:
Years Active: 2003-2006
Title: Tatsuya Matsumi: Innovator in Semiconductor Technology
Introduction
Tatsuya Matsumi is a prominent inventor based in Sagamihara, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on developing advanced resist compositions and methods that enhance the manufacturing processes of semiconductor devices.
Latest Patents
Matsumi's latest patents include a range of innovative technologies. One of his notable inventions is a chemical amplification type positive resist composition. This composition comprises polyhydroxystyrene, which has been modified to improve its solubility in alkali solutions when treated with acid. Another significant patent is a resist laminated material and a resist pattern forming method. Additionally, he has developed a method for manufacturing semiconductor devices that aims to decrease surface defects in patterned resist layers. This method involves a series of steps, including forming a photoresist layer, patternwise exposing it, and treating it with an aqueous acidic solution to enhance the quality of the resist layer.
Career Highlights
Matsumi is currently associated with Tokyo Ohka Kogyo Co., Ltd., a company known for its advancements in chemical products for the semiconductor industry. His work has been instrumental in pushing the boundaries of semiconductor manufacturing techniques.
Collaborations
Throughout his career, Matsumi has collaborated with notable colleagues, including Kazuyuki Nitta and Taku Nakao. These collaborations have contributed to the development of innovative solutions in the semiconductor field.
Conclusion
Tatsuya Matsumi's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in manufacturing processes and materials used in semiconductor devices.