The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 26, 2005

Filed:

Jun. 28, 2002
Applicants:

Kazuyuki Nitta, Ebina, JP;

Takeyoshi Mimura, Koza-gun, JP;

Satoshi Shimatani, Yokohama, JP;

Waki Okubo, Koza-gun, JP;

Tatsuya Matsumi, Sagamihara, JP;

Inventors:

Kazuyuki Nitta, Ebina, JP;

Takeyoshi Mimura, Koza-gun, JP;

Satoshi Shimatani, Yokohama, JP;

Waki Okubo, Koza-gun, JP;

Tatsuya Matsumi, Sagamihara, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kanagawa-ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F007/004 ; G03F007/30 ;
U.S. Cl.
CPC ...
Abstract

The present invention provides a resist composition comprising (A) polyhydroxystyrene in which at least a portion of hydrogen atoms of hydroxyl groups are substituted with an acid-dissociable dissolution inhibiting group, and the solubility in an alkali solution of the polyhydroxystyrene increasing when the acid-dissociable dissolution inhibiting group is eliminated by an action of an acid, and (B) a component capable of generating an acid by irradiation with radiation, wherein a retention rate of the acid-dissociable dissolution inhibiting group of the component (A) after a dissociation test using hydrochloric acid is 40% or less, and also provides a chemical amplification type positive resist composition which contains polyhydroxystyrene in which at least a portion of hydrogen atoms of hydroxyl groups are substituted with a lower alkoxy-alkyl group having a straight-chain or branched alkoxy group, and the solubility in an alkali solution of the polyhydroxystyrene increasing when the lower alkoxy-alkyl group is eliminated by an action of an acid, in place of the component (A).


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