Isehara, Japan

Tatsuo Osaka

This inventor holds 1 USPTO granted patent. Top assignee: Canon Kabushiki Kaisha. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tatsuo Osaka. Retrieved from https://idiyas.com/inventor/tatsuo-osaka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Innovations of Tatsuo Osaka

Introduction

Tatsuo Osaka is a notable inventor based in Isehara, Japan. He has made significant contributions to the field of measurement technology, particularly in the area of droplet shape measurement.

Latest Patents

Osaka holds a patent for a "Droplet shape measuring method and apparatus." This innovative method allows for the accurate measurement of shape features of minute droplets arranged on a substrate. By perpendicularly irradiating the substrate with laser light, diffracted light fluxes generated during the passage of the laser light through the droplet interfere with each other, resulting in a diffraction pattern. This pattern is captured by an image pickup apparatus, enabling the measurement of the droplet's shape feature using the resultant diffraction pattern and the droplet's refractive index.

Career Highlights

Tatsuo Osaka is associated with Canon Kabushiki Kaisha, a leading company in imaging and optical products. His work at Canon has allowed him to develop and refine his innovative measurement techniques.

Collaborations

Osaka has collaborated with notable coworkers, including Yoshikatsu Okada and Shigeru Yamada. Their combined expertise has contributed to advancements in measurement technologies.

Conclusion

Tatsuo Osaka's contributions to droplet shape measurement technology exemplify the innovative spirit of modern inventors. His work continues to influence the field and showcases the importance of precision in measurement techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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