Kanagawa, Japan

Tatsuo Ishikawa

USPTO Granted Patents = 15 

Average Co-Inventor Count = 2.6

ph-index = 2

Forward Citations = 17(Granted Patents)


Location History:

  • Kanagawa, JP (1999 - 2008)
  • Odawara, JP (2002 - 2013)
  • Shizuoka, JP (2021)
  • Haibara-gun, JP (2021 - 2024)

Company Filing History:


Years Active: 1999-2025

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15 patents (USPTO):

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Title:

The Inventive Journey of Tatsuo Ishikawa: Pioneering Innovations in Light-Shielding Technology

Introduction:

Tatsuo Ishikawa, a prolific inventor hailing from Kanagawa, JP, has made significant contributions to the field of light-shielding technology. With an impressive portfolio of 13 patents, Ishikawa continues to push the boundaries of innovation in his domain.

Latest Patents:

Ishikawa's latest patents include a range of cutting-edge inventions such as a light-shielding composition, cured film, color filter, light-shielding film, solid-state imaging element, and image display device. His work showcases a deep understanding of materials science and polymer chemistry, exemplified by the intricate compositions of his patented products.

Career Highlights:

Having worked with renowned companies like Fujifilm Corporation and Fuji Photo Film Company, Limited, Ishikawa has honed his expertise in the intersection of technology and creativity. His innovative solutions have garnered recognition in the industry for their quality and efficacy, setting a high standard for his peers.

Collaborations:

Throughout his career, Ishikawa has collaborated with esteemed colleagues such as Mikio Ohno and Tomohiro Ichikawa. Together, they have synergized their talents to overcome challenges and drive forward groundbreaking projects that have left a lasting impact on the field of light-shielding technology.

Conclusion:

In conclusion, Tatsuo Ishikawa stands as a beacon of innovation and ingenuity in the realm of patents. His relentless quest for excellence and his commitment to pushing the boundaries of what is possible make him a true trailblazer in the world of inventors. We eagerly await his future contributions and look forward to witnessing the next chapter of his remarkable career.

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