This inventor holds 3 USPTO granted patents. Top assignee: Anelva Corporation. Active years: 1987-1990.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Tokyo, JP (1987 - 1990)
- Fuchu, JP (1990)
Company Filing History:
Years Active: 1987-1990
Title: Innovations of Tatsuo Asamaki
Introduction
Tatsuo Asamaki is a notable inventor based in Fuchu, Japan. He has made significant contributions to the field of plasma processing technology. With a total of 3 patents to his name, Asamaki's work focuses on enhancing the efficiency and effectiveness of plasma processing apparatuses.
Latest Patents
One of his latest inventions is a plasma processing apparatus that comprises a vacuum vessel, an anode, and a cathode arranged within the vessel. This apparatus features a discharge producing power source that intermittently generates a main discharge between the anode and cathode to process substrates nearby. The design includes a magnetic field setting device with magnetic coils and alternating current power sources, allowing for increased processing speeds while minimizing temperature rise and potential damage to the substrates.
Another significant patent is an apparatus for processing an object using gas plasma with reduced damage. This invention utilizes gas plasma generated from predetermined gases, such as nitrogen, in conjunction with electromagnetic waves and various magnetic fields. The apparatus is designed to confine the gas plasma effectively, ensuring that ultraviolet rays and charged or neutral particles can be utilized for processing objects held within the reaction vessel.
Career Highlights
Asamaki is currently associated with Anelva Corporation, where he continues to innovate in the field of plasma technology. His work has been instrumental in advancing the capabilities of plasma processing, making it more efficient and less damaging to sensitive materials.
Collaborations
Some of his notable coworkers include Kiyoshi Hoshino and Katsumi Ukai, who have collaborated with him on various projects within the company.
Conclusion
Tatsuo Asamaki's contributions to plasma processing technology reflect his dedication to innovation and improvement in this specialized field. His patents demonstrate a commitment to enhancing processing efficiency while reducing potential damage to substrates.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile