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For the Inventor, By the Inventor

Yokohama, Japan

Tatsuhiko Shibuya

This inventor holds 8 USPTO granted patents. Top assignee: Tokyo Ohka Kogyo Co., Ltd.. Active years: 1997-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tatsuhiko Shibuya. Retrieved from https://idiyas.com/inventor/tatsuhiko-shibuya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 8

% Patents Active = 87.5

Average Co-Inventor Count = 2.3

ph-index = 5

Forward Citations = 70(Granted Patents)


Location History:

  • Kanagawa-ken, JP (1997 - 1999)
  • Yokohama, JP (2001 - 2006)
  • Kawasaki, JP (2006 - 2007)

Company Filing History:

goldMedal8 out of 1,236 
 
Tokyo Ohka Kogyo Co., Ltd.
 patents

Years Active: 1997-2007

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8 patents (USPTO):Explore Patents
1. 7235500 - Material for forming silica based film (2007-06-26),
2. 7135064 - Silica-based coating film on substrate and coating solution therefor (2006-11-14),
3. 7060361 - Silica-based organic film and method of manufacturing the same, and base material comprising organic film (2006-06-13),
4. 6875262 - Silica-based coating film on substrate and coating solution therefor (2005-04-05),
5. 6338868 - Method for the formation of a siliceous coating film (2002-01-15),
6. 6190788 - Method for the formation of a siliceous coating film (2001-02-20),
7. 5885654 - Polysilazane-based coating solution for interlayer insulation (1999-03-23),
8. 5614271 - Method for the formation of a silica-based coating film (1997-03-25),

Title: Innovations of Tatsuhiko Shibuya

Introduction

Tatsuhiko Shibuya is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of materials science, particularly in the development of silica-based films. With a total of eight patents to his name, Shibuya's work has had a considerable impact on various applications in technology.

Latest Patents

One of Shibuya's latest patents is for a material designed for forming silica-based films. This innovative material enables the production of silica-based films with a reduced etching rate relative to hydrofluoric acid. The composition includes a solid fraction containing a film-forming component, an organic solvent, and water, with the water content ranging from 0.1 to 50% by weight as determined by gas chromatography measurement.

Another notable patent involves a silica-based coating film that has a low dielectric constant not exceeding 2.5. This coating can be applied to the surface of a substrate to serve as a planarizing layer or an interlayer insulating layer. The unique coating solution is created from a hydrolysis-condensation product of polyalkoxy silane compounds, which undergoes a specific process involving a basic catalyst and solvent replacement, followed by drying and baking at high temperatures.

Career Highlights

Shibuya is currently associated with Tokyo Ohka Kogyo Co., Ltd., a company known for its advancements in chemical products and materials. His work at the company has allowed him to explore innovative solutions in the field of silica-based materials.

Collaborations

Throughout his career, Shibuya has collaborated with notable colleagues, including Yoshio Hagiwara and Yasushi Fujii. These collaborations have contributed to the advancement of their shared research interests and innovations.

Conclusion

Tatsuhiko Shibuya's contributions to the field of materials science, particularly through his patents on silica-based films, highlight his role as a leading inventor. His work continues to influence technological advancements in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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