Hamura, Japan

Taro Asai

This inventor holds 2 USPTO granted patents. Top assignee: Hitachi, Ltd.. Active years: 2008-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Taro Asai. Retrieved from https://idiyas.com/inventor/taro-asai-b53gv0on

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2008-2010

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2 patents (USPTO):Explore Patents

Title: Taro Asai - Innovator in Semiconductor Technology

Introduction

Taro Asai is a prominent inventor based in Hamura, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on improving the efficiency and productivity of semiconductor manufacturing processes.

Latest Patents

One of Taro Asai's latest patents is a semiconductor device and manufacturing method aimed at enhancing productivity in semiconductor device fabrication. This innovative method involves the formation of a lower electrode, insulating films, an upper electrode, and additional insulating films on a semiconductor substrate within a designated sensor region. A cavity is created between the insulating films above the lower electrode, which, along with the lower electrode, insulating film, and upper electrode, forms a variable capacity sensor. The cavity is produced by etching a sacrificial pattern between the insulation films through a hole formed in a pair of insulation films. In regions outside the sensor area, a dummy lower electrode and four insulating films are established on the TEG region of the semiconductor substrate, with a dummy cavity formed between a pair of insulation films above the lower electrode, although no conductive layer is created on the same layer as the upper electrode on the dummy cavity.

Career Highlights

Taro Asai is currently employed at Hitachi, Ltd., where he continues to develop innovative solutions in semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor devices, making them more efficient and effective for various applications.

Collaborations

Throughout his career, Taro has collaborated with notable colleagues, including Shuntaro Machida and Hiroyuki Enomoto. These collaborations have contributed to the successful development of his patents and innovations in the semiconductor field.

Conclusion

Taro Asai is a distinguished inventor whose work in semiconductor technology has led to significant advancements in manufacturing processes. His contributions continue to shape the future of the semiconductor industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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