Beaverton, OR, United States of America

Tarannum Tiasha


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2025

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Tarannum Tiasha: Innovator in Integrated Circuit Technology

Introduction

Tarannum Tiasha is a prominent inventor based in Beaverton, Oregon. She has made significant contributions to the field of integrated circuit technology. Her innovative work has led to the development of a unique patent that enhances the functionality of electronic devices.

Latest Patents

Tarannum holds a patent for "Hybrid etch stop layers." This invention involves an integrated circuit that includes a first layer and a second layer positioned above the first layer. A third layer is situated between a first section of the first layer and a first section of the second layer. Additionally, a fourth layer is laterally adjacent to the third layer, positioned between a second section of the first layer and a second section of the second layer. Notably, the first dielectric material of the third layer differs from the second dielectric material of the fourth layer, either compositionally or structurally. In this design, the third and fourth layers serve as etch stop layers, which can be coplanar with respect to their top surfaces, bottom surfaces, or both.

Career Highlights

Tarannum Tiasha is currently employed at Intel Corporation, where she continues to push the boundaries of technology. Her work at Intel has allowed her to collaborate with some of the brightest minds in the industry.

Collaborations

Some of her notable coworkers include Deepyanti Taneja and Travis W LaJoie. These collaborations have fostered an environment of innovation and creativity, contributing to the advancement of integrated circuit technology.

Conclusion

Tarannum Tiasha is a trailblazer in the field of integrated circuits, with her patent for hybrid etch stop layers showcasing her innovative spirit. Her contributions to Intel Corporation and collaborations with talented colleagues further highlight her impact on technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…