Helsinki, Finland

Tapio Korpela

This inventor holds 1 USPTO granted patent, plus 1 CIPO patent and 1 EPO patent. Top assignee: Outotec (Finland) Oy. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tapio Korpela. Retrieved from https://idiyas.com/inventor/tapio-korpela

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


 

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Tapio Korpela: Innovator in Slurry Sampling Technology

Introduction

Tapio Korpela is a notable inventor based in Helsinki, Finland. He has made significant contributions to the field of slurry sampling technology. His innovative approach has led to the development of a unique method and apparatus for taking slurry samples from a continuous gravity process flow.

Latest Patents

Korpela holds a patent for a "Method and apparatus for taking slurry samples from a continuous gravity process flow, and use of apparatus." This invention involves a two-stage sampling process utilizing primary and secondary sampling units. The design allows for pressureless open-channel type flows, ensuring that the secondary sample flow is approximately proportional to the instantaneous flow rate of the process flow.

Career Highlights

Tapio Korpela is associated with Outotec (Finland) Oy, where he has applied his expertise in developing advanced sampling technologies. His work has been instrumental in enhancing the efficiency and accuracy of slurry sampling processes in various industrial applications.

Collaborations

Korpela has collaborated with professionals such as Christian Von Alfthan, contributing to the advancement of technology in his field.

Conclusion

Tapio Korpela's innovative contributions to slurry sampling technology exemplify the impact of dedicated inventors in advancing industrial processes. His patent reflects a significant step forward in ensuring accurate and efficient sampling methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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