The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2017
Filed:
Sep. 16, 2013
Outotec (Finland) Oy, Espoo, FI;
Tapio Korpela, Helsinki, FI;
Christian Von Alfthan, Espoo, FI;
Outotec (Finland) Oy, Espoo, FI;
Abstract
A method and an apparatus for taking slurry samples from a continuous gravity process flow (PF). The sampling is carried out in two stages by first and second sampling units (). The primary sample flow (PSF) and the secondary sample flow (SSF) are arranged as pressureless open-channel type flows, so that the flow rate of the secondary sample flow (SSF) to be led for analysis is approximately proportional to an instantaneous flow rate of the process flow (PF). In the apparatus, the first sampling unit () and the second sampling unit () comprise venting means () adjacent the upper ends () of their respective first and second side walls () to allow equalizing of the atmospheric pressure prevailing inside and outside the first and second sampling units above free liquid levels () of the primary and secondary slurry flows (PSF, SSF) along the entire lengths of the sampling units to form pressure—less open-channel type flow paths for the primary and secondary sample flows (PSF, SSF).
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