Tao Dou

Title: Innovations of Tao Dou in Semiconductor Technology

Introduction

Tao Dou is a prominent inventor based in Shanghai, China, known for his contributions to semiconductor technology. With a total of two patents to his name, he has made significant advancements in the field, particularly in semiconductor structures and fabrication methods.

Latest Patents

Tao Dou's latest patents include a semiconductor structure and a fabrication method thereof. This method involves providing a to-be-etched layer, forming an initial mask layer over it, and creating a patterned structure that exposes a portion of the initial mask layer. The process continues with the formation of a barrier layer on the sidewall surface of the patterned structure, followed by an ion doping process to create doped and un-doped regions. The final steps include removing the patterned structure and barrier layer, and forming a mask layer that includes an opening exposing the top surface of the to-be-etched layer.

Another notable patent is a method of forming a semiconductor structure that includes providing a to-be-etched layer and forming a core layer over it. This core layer features a trench that extends in a specific direction. A sidewall spacer layer is then formed, followed by the creation of a block cut structure within the trench. The process concludes with etching back the sidewall spacer layer to expose the core layer's top surface, leaving a sidewall spacer on the trench's sidewalls.

Career Highlights

Tao Dou has worked with leading companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation in Shanghai and Beijing. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in semiconductor technology.

Collaborations

Throughout his career, Tao Dou has collaborated with notable colleagues such as Bo Su and Qian Jiang Zhang. These partnerships have fostered an environment of innovation and creativity, leading to advancements in semiconductor fabrication methods.

Conclusion

Tao Dou's work in semiconductor technology exemplifies the spirit of innovation and dedication to advancing the field. His patents reflect a deep understanding of semiconductor structures and methods, contributing to the ongoing evolution of technology in this critical area.