Company Filing History:
Years Active: 2015
Title: Innovations in Substrate Manufacturing: The Patents of Tanja Ippisch
Introduction: Tanja Ippisch, an innovative inventor based in Steinberg am See, Germany, has made significant contributions to the field of device manufacturing on substrates. With one patent to her name, Ippisch continues to elevate the standards of manufacturing processes through her groundbreaking methods.
Latest Patents: Tanja Ippisch holds a patent for a "Method for manufacturing a device on a substrate." This innovative method involves several key steps, including the formation of a layer structure on the substrate, the addition of an auxiliary layer, and the creation of a planarization layer. Through a chemical mechanical polishing process, Ippisch's method effectively exposes the auxiliary layer while ensuring a differential removal rate between the planarization and auxiliary layers, resulting in a finely tuned planar surface.
Career Highlights: Ippisch is associated with Infineon Technologies AG, a leading global semiconductor company where she applies her expertise in substrate manufacturing. Her contributions help in steering advancements in semiconductor technology, enhancing device performance, and manufacturing efficiency.
Collaborations: Within Infineon Technologies, Tanja collaborates with talented professionals, including her coworkers Sandra Obernhuber and Christof Jalics. Their teamwork fosters an environment of innovation and creativity, facilitating the development of cutting-edge technologies in the semiconductor industry.
Conclusion: Tanja Ippisch represents a new wave of inventors contributing to technological advancements in device manufacturing. With her patent and collaborative spirit at Infineon Technologies AG, she is poised to continue driving innovation and excellence in her field. The significance of her work underlines the vital role inventors play in shaping the future of technology.