This inventor holds 1 USPTO granted patent and 7 published patent applications. Top assignee: Lam Research Corporation. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Taner Ozel - Innovator in Mask Layer Control Technology
Introduction
Taner Ozel is a notable inventor based in Fremont, CA (US). He has made significant contributions to the field of semiconductor manufacturing, particularly in the control of mask critical dimensions. His innovative approach has led to advancements that enhance the precision and efficiency of mask layer applications.
Latest Patents
Taner Ozel holds a patent titled "Control of mask CD." This patent describes a method for controlling a critical dimension of a mask layer. The method involves receiving various parameter levels and generating primary and secondary signals that transition between these levels. This innovative technique aims to improve the accuracy of mask layer dimensions, which is crucial in semiconductor fabrication.
Career Highlights
Taner Ozel is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has positioned him as a key player in developing technologies that drive advancements in semiconductor manufacturing processes.
Collaborations
Taner has collaborated with talented coworkers, including Beibei Jiang and Chen Chen. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Taner Ozel's contributions to mask layer control technology exemplify the impact of innovative thinking in the semiconductor industry. His patent and work at Lam Research Corporation highlight his commitment to advancing technology in this critical field.