Tan Poh Suan

Title: Innovations by Tan Poh Suan: Pioneering Integrated Circuit Technology

Introduction

Tan Poh Suan is a distinguished inventor from Singapore, renowned for his contributions to the field of integrated circuit technology. With a remarkable portfolio that includes two patents, he has played a vital role in advancing methods that enhance semiconductor fabrication processes.

Latest Patents

Tan's latest patents focus on the development of a novel LOCOS mask designed for suppression of narrow space field oxide thinning and the oxide punch-through effect. This innovative design significantly improves control over the birds beak phenomenon, particularly in sub-half-micron integrated circuit technology. The mask employs a thin tapered silicon nitride foot, which provides flexibility during the early stages of oxidation, allowing for in-situ stress relief. As oxidation progresses, the stiffness of the mask increases, effectively inhibiting the penetration of the birds beak. By reducing shear stresses responsible for dislocation generation by up to fifty-fold, Tan's design not only improves surface topography but also suppresses oxide punch-through and the narrow oxide thinning effect.

Career Highlights

Currently, Tan Poh Suan is associated with Chartered Semiconductor Manufacturing Ltd, where his expertise in semiconductor technology is utilized to drive innovation. His work has had significant implications for the efficiency and reliability of integrated circuits, underlining his role as a leading figure in his field.

Collaborations

Throughout his career, Tan has collaborated with esteemed colleagues, including Igor V. Peidous and Konstantin V. Loiko. These collaborations have fostered an environment of innovation and knowledge sharing, further enhancing the development of advanced semiconductor technologies.

Conclusion

Tan Poh Suan’s contributions to the innovation landscape, particularly in the realm of semiconductor technology, highlight his role as a pivotal inventor. His patents provide solutions to complex challenges in integrated circuit fabrication, paving the way for future advancements in the industry. His dedication to improving technology continues to inspire innovation among peers and future inventors.