Tan Leong Seng

Title: Tan Leong Seng: Innovator in Semiconductor Technology

Introduction

Tan Leong Seng is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, holding a total of three patents. His work focuses on advanced semiconductor devices that enhance performance and efficiency.

Latest Patents

Tan Leong Seng's latest patents include the "Split Dual Gate Field Effect Transistor." This innovative semiconductor device features at least two gate regions, which are crucial for its operation. The device comprises a substrate region with a surface, a source region, and a drain region, both of which are separate from each other. The first and second gate regions are positioned on the surface, separated by an insulation region. This design allows for the formation of two distinct channels in the substrate region, enhancing the device's functionality. Additionally, he has developed a "Method for Making Split Dual Gate Field Effect Transistor," which outlines the process of creating this advanced semiconductor device.

Career Highlights

Throughout his career, Tan Leong Seng has worked with notable companies in the semiconductor industry. He has been associated with Semiconductor Manufacturing International Corporation in Shanghai and Beijing. His experience in these leading firms has contributed to his expertise in semiconductor technology.

Collaborations

Tan has collaborated with several professionals in his field, including Deyuan Xiao and Gary Chen. These collaborations have further enriched his work and innovations in semiconductor devices.

Conclusion

Tan Leong Seng is a key figure in the semiconductor industry, known for his innovative patents and contributions to technology. His work continues to influence the development of advanced semiconductor devices.