Tokorozawa, Japan

Tamura Masao


Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 51(Granted Patents)


Company Filing History:


Years Active: 1986

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1 patent (USPTO):Explore Patents

Title: The Innovations of Tamura Masao: A Pioneering Inventor in Semiconductor Technology

Introduction: Tamura Masao is an accomplished inventor located in Tokorozawa, Japan, renowned for his significant contributions to the field of semiconductor technology. With a noteworthy patent to his name, he has advanced the methods by which three-dimensional semiconductor devices are manufactured, thereby setting new standards in the industry.

Latest Patents: Tamura holds a patent for a "Method of making three-dimensional semiconductor devices in selectively." This innovation details a semiconductor device featuring at least one lower resistance region crafted within a single-crystalline semiconductor film. This film is engineered to seamlessly coat both a single-crystalline semiconductor substrate and an insulating film situated on the substrate's surface. The unique characteristic of this semiconductor device is that it employs a single-crystalline semiconductor film created by the irradiation of a polycrystalline or amorphous semiconductor film with a laser beam. The advantages afforded by this innovative design mark a significant improvement over previous semiconductor technologies.

Career Highlights: Tamura Masao has made tremendous strides in his career at Hitachi, Ltd., a leader in technological innovations and advancements. His work reflects his dedication to advancing semiconductor technology and contributing to the broader electronic industry.

Collaborations: In his notable endeavors, Tamura has collaborated with esteemed colleagues, including Hirotsugu Kozuka and Yasuo Wada. These partnerships have fostered a creative environment that promotes innovation and the successful development of cutting-edge technologies.

Conclusion: Tamura Masao’s contributions to the field of semiconductor technology underscore the importance of innovation within the industry. Through his patent for the method of creating three-dimensional semiconductor devices, he has paved the way for future advancements. His work continues to inspire fellow inventors and engineers, as the realm of semiconductor technology evolves with each new innovation.

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