Hillsboro, OR, United States of America

Talha Khan

This inventor holds 1 USPTO granted patent. Top assignee: Intel Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Talha Khan. Retrieved from https://idiyas.com/inventor/talha-khan-3yr0o21r

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Talha Khan: Advancing Optical Proximity Correction for Integrated Circuits.

Introduction

Talha Khan is an inventor based in Hillsboro, Oregon, and works at Intel Corporation. His patent work addresses optical proximity correction, a process used to improve how integrated circuit patterns are transferred from photomasks during manufacturing.

Latest Patents

Khan is associated with 1 patent: “Enhanced Mask Pattern-Aware Heuristics for Optical Proximity Corrections for Integrated Circuits.” The disclosure describes methods for predicting contours of adjacent photomask polygons while accounting for corner rounding. It then uses those predictions to determine the minimum distance between the contours, supporting optical proximity corrections for integrated circuits.

Career Highlights

Khan’s disclosed invention focuses on improving contour prediction and distance estimation in photomask patterning. These techniques address geometric effects that can influence the accuracy of integrated circuit manufacturing.

Collaborations

The patent lists Timothy C. Johnston and Seongtae Jeong among Khan’s coworkers. The work is associated with Intel Corporation.

Conclusion

Talha Khan’s patent reflects work on mask-aware heuristics for optical proximity correction, contributing to methods for predicting photomask contours and supporting integrated circuit patterning.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…