Rishon-LeZion, Israel

Tal Zur

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Siemens Industry Software Gmbh. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tal Zur. Retrieved from https://idiyas.com/inventor/tal-zur-g275njdb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Tal Zur: Inventor in PCB Manufacturing Analysis

Introduction

Tal Zur is an inventor based in Rishon-LeZion, Israel. His patent work addresses the use of manufacturing capability data in printed circuit board (PCB) analysis.

Latest Patents

Zur is named on 1 patent: “Method and System for Activating a PCB Analysis Utilizing Manufacturing Capability Data.” The invention describes a system in which a design-for-manufacturing (DFM) application uses manufacturing capability data shared through a collaborative, multi-tenant network spanning cloud and on-premise environments. A tenant requests authorization to use a DFM profile stored in a cloud data layer. Once authorized, the profile is downloaded in a locked DFM envelope tied to the tenant’s account identifier. The application permits the profile to be unlocked for PCB analysis only when the logged-in account matches that identifier.

Career Highlights

Zur is associated with Siemens Industry Software GmbH. His patent describes a way to control access to shared DFM profiles while enabling PCB analysis with manufacturing capability data.

Collaborations

The provided information lists Max Clark and Alex Zigelboim as Zur’s coworkers. It does not specify their roles in the patent or the invention.

Conclusion

Tal Zur’s patent focuses on securely authorizing access to shared manufacturing capability data for PCB analysis, connecting cloud-based collaboration with on-premise DFM applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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