This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Mitsubishi Denki Kabushiki Kaisha. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003
Title: Takuya Matsushita: Innovator in Semiconductor Technology
Introduction
Takuya Matsushita, an accomplished inventor based in Tokyo, Japan, has made significant contributions to the field of semiconductor technology. With two patents to his name, Matsushita has demonstrated a fervent commitment to innovation and advancement in the industry.
Latest Patents
Matsushita's latest patents include a photomask and a semiconductor device, alongside a method for exposing through the photomask. His invention encompasses a comprehensive photomask that consists of a substrate featuring an on-mask circuit area, an on-mask test mark area, and a photolithography screening mark area. This design allows for precise measurements of overlay displacement during the photolithography process, enhancing the accuracy of semiconductor manufacturing. Furthermore, his innovative approach to managing focus offset values in semiconductor devices facilitates improved manufacturing processes, ensuring high-quality production standards.
Career Highlights
Takuya Matsushita is associated with Mitsubishi Electric Corporation, a prominent player in the technology and semiconductor sectors. His work there is pivotal, as he continuously seeks advancements that redefine standards in semiconductor manufacturing and technology.
Collaborations
Throughout his career, Matsushita has collaborated with notable colleagues, including Toshihide Kawachi and Shigenori Yamashita. These partnerships have fostered a collaborative environment that encourages innovative thinking and the development of groundbreaking solutions within the industry.
Conclusion
Takuya Matsushita's contributions to semiconductor technology reflect his dedication to innovation and excellence. With his patents in photomask technology and methodologies, he is poised to influence the future landscape of semiconductor manufacturing, helping to propel the industry forward. His ongoing work promises to revolutionize how devices are made, showcasing the essential role of inventors in driving technological progress.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile