The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2003
Filed:
Feb. 02, 2001
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A product pattern and a test pattern for managing a focus offset value are patterned onto a product wafer by means of exposure, and is patterned onto the product wafer by means of exposure. The exposed product wafer is developed. A measurement section measures the dimension of the test pattern patterned on the product wafer. On the basis of the thus-measured dimension of the test pattern, the focus off set value set in a system for manufacturing a semiconductor device is computed by a computation section. The focus offset value set in a projection optical system of the system for manufacturing a semiconductor device is adjusted by means of an adjustment section so as to become identical with the computed focus offset value.