Company Filing History:
Years Active: 2021-2025
Title: Takuo Shimada: Innovator in Flow Measurement Technology
Introduction
Takuo Shimada is a notable inventor based in Hino, Japan. He has made significant contributions to the field of flow measurement technology, holding 2 patents that showcase his innovative spirit and technical expertise.
Latest Patents
One of his latest patents is a flowmeter designed for measuring the flow of extremely low and high temperature fluids. This flowmeter includes a flow path pipe, an impeller that rotates within the pipe, and a sensor that measures fluid flow through the impeller's rotation. The sensor features a metal-based wiring substrate housed outside the flow path pipe, equipped with a magnetic sensor package, a heater, and a temperature control circuit. This design allows for precise flow measurement in challenging temperature conditions.
Another significant invention by Shimada is a flow rate control device aimed at reducing manufacturing costs and simplifying maintenance. This device consists of a flow rate adjusting valve, a flow rate measurement part, and a controller that adjusts the valve's opening based on flow measurements. It also includes a pressure deficiency detection function that alerts users to potential issues before they escalate, enhancing operational efficiency.
Career Highlights
Takuo Shimada is currently associated with Toflo Corporation, where he continues to develop innovative solutions in fluid measurement and control. His work has been instrumental in advancing technologies that improve efficiency and reduce costs in various applications.
Collaborations
Shimada collaborates with talented individuals such as Takahiro Kawamoto and Shinji Tobimatsu, contributing to a dynamic team focused on innovation and excellence in their field.
Conclusion
Takuo Shimada's contributions to flow measurement technology reflect his dedication to innovation and problem-solving. His patents not only demonstrate his technical skills but also his commitment to improving industrial processes.