The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2021
Filed:
Sep. 07, 2017
Toflo Corporation, Hino, JP;
Takahiro Kawamoto, Hino, JP;
Takuo Shimada, Hino, JP;
Shinji Tobimatsu, Hino, JP;
Tetsuaki Sekine, Hino, JP;
TOFLO CORPORATION, Tokyo, JP;
Abstract
An object is to provide a flow rate control device that can suppress a manufacturing cost and greatly reduce burdens of setting and maintenance. A flow rate control deviceof the invention is comprised with a flow rate adjusting valvethat is installed in a flow path, a flow rate measurement partthat measures a flow rate of a fluid flowing through the flow path, a controllerthat controls opening degrees of the flow rate adjusting valvebased on a measurement result of the flow rate measurement part, and a pressure deficiency detecting function that detects pressure deficiency when a limit sensor(an opening detecting sensor) that detects the opening of the flow rate adjusting valvedetects the opening degrees are full. With the structure, it becomes possible, compared with a conventional system to detect a pressure deficiency using a pressure sensor, to suppress a manufacturing cost and greatly reduce burdens of setting and maintenance and to notify of pressure deficiency at a necessary timing in an early stage before an abnormality occurs due to a flow rate decrease.