Takuma Hojo

Title: Takuma Hojo: Innovator in Positive Resist Composition

Introduction

Takuma Hojo is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of positive resist compositions, which are essential in the semiconductor manufacturing process. With a total of 4 patents to his name, Hojo's work has advanced the capabilities of resist materials used in lithography.

Latest Patents

Hojo's latest patents include a positive resist composition and a method of forming a resist pattern. The first patent describes a positive resist composition that exhibits a large exposure margin, excellent resolution, and dry etching resistance. This composition includes a resin component that contains acid dissociable, dissolution inhibiting groups, which enhance alkali solubility under acid action. The second patent focuses on a similar positive resist composition capable of forming high-resolution patterns with reduced line edge roughness (LER). This composition also features a resin component with specific structural units derived from hydroxystyrene and acrylate esters.

Career Highlights

Takuma Hojo is currently employed at Tokyo Ohka Kogyo Co., Ltd., a company known for its innovative solutions in the semiconductor industry. His work has been instrumental in developing advanced materials that meet the increasing demands of modern technology.

Collaborations

Throughout his career, Hojo has collaborated with notable colleagues, including Kiyoshi Ishikawa and Tomoyuki Ando. These collaborations have further enriched his research and development efforts in the field of resist compositions.

Conclusion

Takuma Hojo's contributions to the field of positive resist compositions have significantly impacted semiconductor manufacturing. His innovative patents and collaborations highlight his role as a key figure in advancing technology in this area.