The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2008
Filed:
Apr. 22, 2004
Takuma Hojo, Kawasaki, JP;
Kiyoshi Ishikawa, Kawasaki, JP;
Tsuyoshi Nakamura, Kawasaki, JP;
Tasuku Matsumiya, Kawasaki, JP;
Takuma Hojo, Kawasaki, JP;
Kiyoshi Ishikawa, Kawasaki, JP;
Tsuyoshi Nakamura, Kawasaki, JP;
Tasuku Matsumiya, Kawasaki, JP;
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-Shi, JP;
Abstract
The invention provides a positive photoresist composition which exhibits a high level of etching resistance and attains high resolution, and enables the formation of a fine pattern using an electron beam exposure step, as well as a method for forming a resist pattern that uses the positive photoresist composition. This positive photoresist composition for use with EB contains a resin component (A) that exhibits increased alkali solubility under the action of acid, an acid generator component (B) that generates acid on exposure, and an organic solvent (C), wherein the component (A) comprises a copolymer containing a first structural unit (a) derived from hydroxystyrene and a second structural unit (a) derived from a (meth)acrylate ester having an alcoholic hydroxyl group, and a portion of the hydroxyl groups of the structural units (a) and the alcoholic hydroxyl groups of the structural units (a) are protected with acid dissociable, dissolution inhibiting groups.