Takeshige Ishida

Title: The Innovations of Takeshige Ishida

Introduction

Takeshige Ishida is a prominent inventor based in Tokyo, Japan. He is known for his contributions to substrate processing technology, which plays a crucial role in various manufacturing processes. His innovative approach has led to significant advancements in the efficiency of substrate processing.

Latest Patents

Ishida holds a patent for a substrate processing device, substrate conveying device, and substrate processing method. This invention allows an unprocessed substrate to be conveyed to a film-processing chamber simultaneously with a processed substrate being conveyed to a substrate preparation chamber. This dual operation reduces the substrate processing cycle, thereby increasing the yield per unit time. The substrate preparation chamber features a two-tiered structure designed to accommodate both processed and unprocessed substrates. Additionally, a two-tiered transfer robot enables the simultaneous removal or placement of substrates into the preparation and processing chambers, further decreasing the cycle time for processing.

Career Highlights

Ishida is associated with Kokusai Electric Co., Ltd., a company renowned for its cutting-edge technology in the semiconductor industry. His work has significantly impacted the efficiency of substrate processing, making him a valuable asset to his organization.

Collaborations

Ishida has collaborated with notable colleagues, including Satohiro Okayama and Motoichi Kanazawa. Their combined expertise has contributed to the development of innovative solutions in substrate processing technology.

Conclusion

Takeshige Ishida's contributions to substrate processing technology exemplify the importance of innovation in the manufacturing sector. His patented inventions have not only improved processing efficiency but also enhanced productivity in the industry.