The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2004
Filed:
Feb. 15, 2000
Satohiro Okayama, Tokyo, JP;
Motoichi Kanazawa, Tokyo, JP;
Takeshige Ishida, Tokyo, JP;
Tomohiko Takeda, Tokyo, JP;
Yukio Akita, Tokyo, JP;
Satoru Ichimura, Tokyo, JP;
Kazunori Suzuki, Tokyo, JP;
Teruo Yoshino, Tokyo, JP;
Tokunobu Akao, Tokyo, JP;
Yasunobu Nakayama, Tokyo, JP;
Kokusai Electric Co., Ltd., Tokyo, JP;
Abstract
An unprocessed substrate is conveyed to a film-processing chamber at the same time a processed substrate is conveyed to a substrate preparation chamber, reducing the substrate processing cycle, thereby increasing the yield per unit time. The substrate preparation chamber has a two-tiered structure for receiving processed substrates and unprocessed substrates. A two-tiered transfer robot allows the substrates to be removed or placed into the preparation and process chambers at the same time, thus decreasing the cycle time for processing a substrate.