Satoru Ichimura

Title: Satoru Ichimura: Innovator in Substrate Processing Technology

Introduction

Satoru Ichimura is a prominent inventor based in Tokyo, Japan. He is known for his significant contributions to substrate processing technology. His innovative approach has led to advancements that enhance efficiency in the semiconductor manufacturing process.

Latest Patents

Ichimura holds a patent for a substrate processing device, substrate conveying device, and substrate processing method. This invention allows an unprocessed substrate to be conveyed to a film-processing chamber simultaneously with a processed substrate being conveyed to a substrate preparation chamber. This dual operation reduces the substrate processing cycle, thereby increasing the yield per unit time. The substrate preparation chamber features a two-tiered structure designed to accommodate both processed and unprocessed substrates. Additionally, a two-tiered transfer robot enables the simultaneous removal or placement of substrates into the preparation and processing chambers, further decreasing the cycle time for substrate processing. He has 1 patent to his name.

Career Highlights

Ichimura is associated with Kokusai Electric Co., Ltd., a company renowned for its cutting-edge technology in the semiconductor industry. His work has been instrumental in developing systems that optimize substrate processing, which is crucial for enhancing production efficiency.

Collaborations

Ichimura has collaborated with notable colleagues, including Satohiro Okayama and Motoichi Kanazawa. Their combined expertise has contributed to the advancement of substrate processing technologies.

Conclusion

Satoru Ichimura's innovative contributions to substrate processing technology have made a significant impact in the semiconductor industry. His work continues to influence advancements in manufacturing efficiency and productivity.