Kokusai Electric Co., Ltd.

Takeshige Ishida

Teruo Yoshino

Tokunobu Akao

Yukio Akita

Satohiro Okayama

Kazunori Suzuki

Tomohiko Takeda

Motoichi Kanazawa

Yasunobu Nakayama

Satoru Ichimura

An unprocessed substrate is conveyed to a film-processing chamber at the same time a processed substrate is conveyed to a substrate preparation chamber, reducing the substrate processing cycle, thereby increasing the yield per unit time. The substrate preparation chamber has a two-tiered structure for receiving processed substrates and unprocessed substrates. A two-tiered transfer robot allows the substrates to be removed or placed into the preparation and process chambers at the same time, thus decreasing the cycle time for processing a substrate.

Substrate processing device, substrate conveying device, and substrate processing method

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Tokyo, Japan

Takeshige Ishida