Takeshi Shinohara

Title: The Innovative Mind of Takeshi Shinohara

Introduction

Takeshi Shinohara, an esteemed inventor based in Nirasaki, Japan, holds a remarkable portfolio of two patents that showcase his innovative contributions to technology. His work primarily focuses on advancing systems in substrate processing apparatuses, addressing critical aspects such as abnormality detection and efficient film deposition methods.

Latest Patents

Shinohara's latest inventions include an **Abnormality Detection System and Control Board**. This sophisticated system features a first controller that governs the substrate processing apparatus and a second controller that manages devices within the apparatus. By coordinating between these controllers, it is capable of detecting abnormalities efficiently. The second controller is equipped with a storage unit, which collects and accumulates status signals from the device over a specified period, while the first controller utilizes these accumulated signals to identify any operational irregularities.

Another significant invention by Shinohara is the **Deposition Device and Deposition Method**. This innovative device contains a reaction gas supply component linked to a defined process space situated between a placement part and a ceiling part. An annular gap facilitates the flow of reaction gas into the process space, enhancing the overall efficiency of film deposition. The design incorporates multiple gas flow channels, which are integral to forming gas-flow walls and optimizing the deposition process.

Career Highlights

Takeshi Shinohara is currently associated with Tokyo Electron Limited, a leading company in the semiconductor and electronic device manufacturing industry. His expertise and inventive capabilities contribute significantly to the company's progression in cutting-edge technology.

Collaborations

Throughout his career, Shinohara has collaborated with notable colleagues, including Katsuhito Hirose and Kunihiro Tada. These associations have fostered a collaborative environment that encourages innovation and the sharing of ideas, resulting in enhanced technological advancements.

Conclusion

In conclusion, Takeshi Shinohara exemplifies a dedicated inventor whose work has a profound impact on the field of substrate processing and film deposition technologies. His innovative patents reflect his commitment to excellence and advancement in technology, ensuring that he maintains a prominent position in the world of inventions.