Takeshi Ohfuji

This inventor holds 7 USPTO granted patents. Top assignees: Nec Corporation, Intel Corporation. Active years: 1997-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takeshi Ohfuji. Retrieved from https://idiyas.com/inventor/takeshi-ohfuji

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 7

% Patents Active = 57.1

Average Co-Inventor Count = 4.6

ph-index = 4

Forward Citations = 102(Granted Patents)

Company Filing History:

Years Active: 1997-2006

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7 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7045260 - Post exposure modification of critical dimensions in mask fabrication (2006-05-16),

2. 7045259 - Post exposure modification of critical dimensions in mask fabrication (2006-05-16),

3. 6801295 - Post exposure modification of critical dimensions in mask fabrication (2004-10-05),

4. 5994025 - Photoresist, compounds for composing the photoresist, and method of (1999-11-30),

5. 5985522 - Photoresist and compounds for composing the photoresist (1999-11-16),

6. 5770346 - Photoresist and compounds for composing the photoresist (1998-06-23),

7. 5665518 - Photoresist and monomer and polymer for composing the photoresist (1997-09-09),

Title: The Innovative Mind of Takeshi Ohfuji

Introduction

Takeshi Ohfuji is a prominent inventor based in Tokyo, Japan, known for his significant contributions to the field of semiconductor fabrication. With a total of seven patents to his name, Takeshi has established himself as a leader in innovation, particularly in the intricate processes involved in mask fabrication. His work exemplifies the intersection of technology and precision engineering.

Latest Patents

One of Takeshi Ohfuji's latest patents revolves around the "Post exposure modification of critical dimensions in mask fabrication." This innovative system and method are designed to modify an exposure image in a radiation-sensitive layer by employing a heterogeneous and non-uniform post-exposure thermal treatment. The process involves providing different portions of the exposure feature with varying thermal fluxes using a thermal modification system. This system can include components like a post-exposure bake oven or a hot plate, expertly configured to deliver different thermal fluxes. Additionally, it employs adjustable spacers that optimize the radiant energy flux from a thermal energy source by modifying the distance between the source and the radiation-sensitive layer.

Career Highlights

Throughout his career, Takeshi Ohfuji has been associated with notable companies such as NEC Corporation and Intel Corporation. His experience in these leading technology firms has helped him refine his skills in innovation and development in semiconductor technologies, paving the way for his successful patent trajectory.

Collaborations

Takeshi Ohfuji has collaborated with esteemed colleagues, including Kaichiro Nakano and Katsumi Maeda. These partnerships have enriched his work and contributed to the advancement of practical applications in the semiconductor industry, fostering a collaborative environment that encourages innovative solutions.

Conclusion

Takeshi Ohfuji's journey as an inventor in Tokyo serves as an inspiration within the realm of innovations and patents. With his seven patents and ongoing contributions to semiconductor technology, he is truly a respected figure whose work continues to impact the industry positively.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]