Hitachi, Japan

Takeshi Eri


Average Co-Inventor Count = 2.6

ph-index = 2

Forward Citations = 16(Granted Patents)


Location History:

  • Tokyo, JP (2010)
  • Hitachi, JP (2012 - 2013)

Company Filing History:


Years Active: 2010-2013

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4 patents (USPTO):Explore Patents

Title: The Innovations of Takeshi Eri

Introduction

Takeshi Eri is a notable inventor based in Hitachi, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on the development of nitride semiconductor substrates, which are crucial for various electronic applications.

Latest Patents

One of his latest patents is titled "Nitride semiconductor free-standing substrate and method for making same." This invention describes a nitride semiconductor free-standing substrate that includes a nitride semiconductor crystal and an inversion domain with a specific density. The method for creating this substrate involves a growth step on a heterosubstrate, followed by a separation step to form the final product. Another significant patent is for a "Group III nitride semiconductor free-standing substrate and method of manufacturing the same." This patent details a substrate with an as-grown surface that features a single crystal plane, which is essential for enhancing the performance of semiconductor devices.

Career Highlights

Throughout his career, Takeshi Eri has worked with prominent companies such as Hitachi Cable, Inc. and NEC Corporation. His experience in these organizations has allowed him to refine his expertise in semiconductor technology and contribute to innovative solutions in the industry.

Collaborations

Takeshi Eri has collaborated with notable colleagues, including Takeshi Meguro and Masatomo Shibata. These partnerships have fostered a creative environment that has led to advancements in their respective fields.

Conclusion

Takeshi Eri's contributions to semiconductor technology through his patents and collaborations highlight his importance as an inventor. His work continues to influence the development of advanced electronic materials and devices.

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