Company Filing History:
Years Active: 2012-2014
Title: Takeru Takushima: Innovator in Silicon Wafer Polishing
Introduction
Takeru Takushima is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the polishing of silicon wafers. With a total of 2 patents to his name, his work has advanced the techniques used in the industry.
Latest Patents
Takushima's latest patents include innovative methods for polishing silicon wafers. The first patent, titled "Method of polishing a silicon wafer," aims to provide a polishing technique that achieves high flatness similar to conventional methods while minimizing defects caused by residual substances in the polishing solution. This method involves supplying a polishing solution containing abrasive grains onto a polishing pad and sliding it against the silicon wafer, with a specific control on the number of abrasive grains to not exceed 5×10 grains/cm.
The second patent, "Method of polishing silicon wafer," describes a process where a polishing solution with minimal abrasive grains is applied to a polishing pad. This method creates a hydroplane layer between the silicon wafer and the polishing pad, allowing for controlled polishing states by adjusting the thickness of the hydroplane layer.
Career Highlights
Takeru Takushima is currently associated with Sumco Corporation, a leading company in the semiconductor industry. His work has been instrumental in enhancing the efficiency and effectiveness of silicon wafer polishing techniques.
Collaborations
Throughout his career, Takushima has collaborated with esteemed colleagues, including Takeo Katoh and Ryuichi Tanimoto. These partnerships have contributed to the development of innovative solutions in the field.
Conclusion
Takeru Takushima's contributions to silicon wafer polishing have made a significant impact on the semiconductor industry. His innovative methods continue to influence the way silicon wafers are processed, ensuring higher quality and efficiency in manufacturing.