Company Filing History:
Years Active: 2012-2023
Title: Takeo Oishi: Innovator in Photopolymerization Technology
Introduction
Takeo Oishi is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photopolymerization, holding a total of 4 patents. His work focuses on developing innovative compounds that enhance the efficiency and stability of photopolymerization processes.
Latest Patents
Among his latest patents, Oishi has developed an oxime ester compound and a photopolymerization initiator containing the same. The oxime ester compound is represented by a specific general formula, where various groups can represent different chemical structures. This compound is particularly useful as a high-sensitivity photopolymerization initiator that efficiently absorbs and is activated by near-ultraviolet light, specifically at 365 nm. Additionally, he has patented a photopolymerization initiator that includes this compound, along with various photosensitive compositions that utilize it.
Career Highlights
Oishi is currently employed at Adeka Corporation, where he continues to innovate in the field of photopolymerization. His work has been instrumental in advancing the technology used in various applications, including photosensitive resin compositions.
Collaborations
Throughout his career, Oishi has collaborated with notable colleagues such as Kiyoshi Murata and Koichi Kimijima. These collaborations have further enriched his research and development efforts in the field.
Conclusion
Takeo Oishi's contributions to photopolymerization technology highlight his role as a leading inventor in this specialized area. His innovative patents and collaborations continue to influence advancements in the industry.