The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 2019

Filed:

Mar. 30, 2015
Applicant:

Adeka Corporation, Tokyo, JP;

Inventors:

Yoko Komiyama, Tokyo, JP;

Takeo Oishi, Tokyo, JP;

Tomoyuki Ariyoshi, Tokyo, JP;

Tomoya Tamachi, Tokyo, JP;

Takayuki Ikaga, Tokyo, JP;

Naomi Sato, Tokyo, JP;

Assignee:

ADEKA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07D 243/36 (2006.01); G03F 7/004 (2006.01); C07D 487/06 (2006.01); C07D 209/14 (2006.01); C08F 2/50 (2006.01); G03F 7/027 (2006.01); G03F 7/031 (2006.01); C07D 401/04 (2006.01); C07D 405/04 (2006.01); C07D 409/04 (2006.01); C07D 209/56 (2006.01); C07D 209/60 (2006.01); C07D 409/10 (2006.01); C07D 471/04 (2006.01);
U.S. Cl.
CPC ...
C07D 487/06 (2013.01); C07D 209/14 (2013.01); C07D 209/56 (2013.01); C07D 209/60 (2013.01); C07D 401/04 (2013.01); C07D 405/04 (2013.01); C07D 409/04 (2013.01); C07D 409/10 (2013.01); C07D 471/04 (2013.01); C08F 2/50 (2013.01); G03F 7/004 (2013.01); G03F 7/027 (2013.01); G03F 7/031 (2013.01);
Abstract

An oxime ester compound represented by general formula (I), wherein Rto Rare as defined in the description, and n is 0 or 1; a photopolymerization initiator containing the compound; a photosensitive composition, alkali-developable photosensitive resin composition, and colored alkali-developable photosensitive resin composition containing the photopolymerization initiator; and a cured product of these compositions are provided. The compound is useful as a high-sensitivity photopolymerization initiator that has good stability and low sublimability and that efficiently absorbs, and is activated by, near-ultraviolet light, e.g., at 365 nm.


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