Adeka Corporation

Takeo Oishi

Kiyoshi Murata

Koichi Kimijima

Daisuke Sawamoto

Naomi Sato

Hirokatsu Shinano

Tomoyuki Ariyoshi

Tomoya Tamachi

Nobuhide Tominaga

Yasunori Kozaki

Yoko Komiyama

Takayuki Ikaga

An oxime ester compound represented by general formula (I): wherein R, R, and Reach independently represent R, OR, COR, SR, CONRR, or CN; R, R, and Reach independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms, Rand Reach independently represent R, OR, SR, COR, CONRR, NRCOR, OCOR, COOR, SCOR, OCSR, COSR, CSOR, CN, a halogen atom, or a hydroxyl group; and a and b each independently represent 0 to 3.

Oxime ester compound and photopolymerization initiator containing the same

An oxime ester compound represented by general formula (I), wherein Rto Rare as defined in the description, and n is 0 or 1; a photopolymerization initiator containing the compound; a photosensitive composition, alkali-developable photosensitive resin composition, and colored alkali-developable photosensitive resin composition containing the photopolymerization initiator; and a cured product of these compositions are provided. The compound is useful as a high-sensitivity photopolymerization initiator that has good stability and low sublimability and that efficiently absorbs, and is activated by, near-ultraviolet light, e.g., at 365 nm. 

Oxime ester compound and photopolymerization initiator containing said compound

A novel compound having satisfactory sensitivity (base generating performance), a photosensitive resin composition containing the compound as a photo-initiator, and a cured product of the composition are provided. Specifically, a compound represented by general formula (1) (compound (1)), a photosensitive resin composition containing (A) a photo-initiator including at least one compound (1) and (B) a photosensitive resin are provided. Preferred are the compound (1) in which Ris an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, the compound (1) in which at least one of R, R, R, R, R, R, and Ris nitro, and the compound (1) in which n is 0.  The symbols in general formula (1) are as defined in the description.

Compound and photosensitive resin composition

A novel compound is a highly-sensitive photopolymerization initiator with excellent stability, low sublimability, excellent developability, and high transmittance in the visible region. It efficiently absorbs, and is activated by, near-ultraviolet rays such as at 365 nm. Also provided are a photopolymerization initiator and a photosensitive composition using such compound. An oxime ester compound is represented by the following general formula (I), a photopolymerization initiator containing the same, and a photosensitive composition containing the photopolymerization initiator and a polymerizable compound having an ethylenically unsaturated bond: Rand Reach represent R, COR, CONRR, CN, etc.; R, R, and Reach represent a Calkyl group, etc.; Rand Reach represent R, OR, COR, CONRR, OCOR, CN, a halogen atom, etc.; a and b each represent an integer 0-4; X represents an oxygen atom, a sulfur atom, etc.; and Rrepresents OH, COOH, or a group represented by general formula (II).

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Tokyo, Japan

Takeo Oishi