Takemitsu Miura

Title: Takemitsu Miura: Innovator in Substrate Processing Technology

Introduction

Takemitsu Miura is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing, holding three patents that showcase his innovative approach to technology.

Latest Patents

One of his latest patents is a substrate processing apparatus and substrate processing method. This invention involves a substrate processing apparatus where an outer edge portion of a substrate in a horizontal state is supported from below by an annular substrate supporting part. A lower surface facing part, which has a facing surface that faces the lower surface of the substrate, is provided inside the substrate supporting part. A gas ejection nozzle is included for ejecting heated gas toward the lower surface, allowing the substrate to be heated by the heated gas while the upper surface of the rotating substrate is processed with a processing liquid ejected from an upper nozzle. Additionally, a lower nozzle is provided in the lower surface facing part to perform processing on the lower surface with a processing liquid. The design ensures that the gas ejection nozzle protrudes from the facing surface, effectively suppressing the flow of processing liquid into the gas ejection nozzle during processing.

Career Highlights

Takemitsu Miura has established himself as a key figure in the substrate processing industry. His work at Screen Holdings Co., Ltd. has allowed him to develop and refine his innovative technologies, contributing to advancements in the field.

Collaborations

Throughout his career, Miura has collaborated with notable colleagues, including Kenji Izumoto and Kenji Kobayashi. These partnerships have fostered a creative environment that has led to the development of cutting-edge technologies.

Conclusion

Takemitsu Miura's contributions to substrate processing technology highlight his innovative spirit and dedication to advancing the field. His patents reflect a deep understanding of the complexities involved in substrate processing, making him a significant figure in the industry.