The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2016
Filed:
Mar. 22, 2012
Applicants:
Ayumi Higuchi, Kyoto, JP;
Yoshiyuki Fujitani, Kyoto, JP;
Takemitsu Miura, Kyoto, JP;
Rei Takeaki, Kyoto, JP;
Inventors:
Ayumi Higuchi, Kyoto, JP;
Yoshiyuki Fujitani, Kyoto, JP;
Takemitsu Miura, Kyoto, JP;
Rei Takeaki, Kyoto, JP;
Assignee:
SCREEN Holdings Co., Ltd., , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 3/04 (2006.01); B08B 3/10 (2006.01); B08B 3/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67248 (2013.01); B08B 3/024 (2013.01); B08B 3/04 (2013.01); B08B 3/10 (2013.01); B08B 3/108 (2013.01); H01L 21/67051 (2013.01); H01L 21/67057 (2013.01); H01L 21/67086 (2013.01); H01L 21/67253 (2013.01);
Abstract
A substrate treatment method that includes circulating a treatment liquid from a treatment vessel through a circulation path extending through a filter and a temperature controller, spouting the treatment liquid toward a substrate accommodated in the treatment vessel to recover the treatment liquid in the treatment vessel, and controlling the liquid surface level of the treatment liquid retained in the treatment vessel below the substrate held at a substrate treatment position.