Company Filing History:
Years Active: 2012-2024
Title: Takehiro Tsunemori: Innovator in Silicon Wafer Measurement Technologies
Introduction
Takehiro Tsunemori is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the measurement of impurities in silicon wafers. With a total of 3 patents to his name, Tsunemori's work has advanced the accuracy of measurements critical to the semiconductor industry.
Latest Patents
Tsunemori's latest patents include a method of measuring the concentration of iron (Fe) in p-type silicon wafers using a Surface Photovoltage (SPV) method. This innovative approach enables improved measurement accuracy for Fe concentrations of 1×10⁻⁶ cm⁻³ or less. The method involves measuring the Fe concentration in a p-type silicon wafer while ensuring that the total concentration of sodium (Na), ammonium (NH), and potassium (K) is maintained at 1.750 μg/m³ or less. Additionally, the total concentration of fluorine (F), chlorine (Cl), nitrogen oxides (NO), phosphorous oxides (PO), bromine (Br), and sulfur oxides (SO) is kept at 0.552 μg/m³ or less.
Career Highlights
Tsunemori is currently employed at Sumco Corporation, a leading company in the semiconductor industry. His work focuses on enhancing the precision of measurements that are vital for the production of high-quality silicon wafers. His innovative methods have been instrumental in improving the overall quality and reliability of semiconductor devices.
Collaborations
Tsunemori collaborates with notable colleagues such as Shinya Fukushima and Eiji Kamiyama. Their combined expertise contributes to the advancement of measurement technologies in the semiconductor field.
Conclusion
Takehiro Tsunemori's contributions to the measurement of impurities in silicon wafers have made a significant impact on the semiconductor industry. His innovative methods and collaborative efforts continue to drive advancements in this critical field.