Location History:
- Iwate, JP (2022)
- Oshu, JP (2022)
Company Filing History:
Years Active: 2022
Title: Takehiro Fukada: Innovator in Film Forming and Deposition Methods
Introduction
Takehiro Fukada is a prominent inventor based in Iwate, Japan. He has made significant contributions to the field of film forming and deposition methods, holding a total of 2 patents. His innovative approaches have advanced the technology used in various applications.
Latest Patents
Fukada's latest patents include a film forming method and a deposition method. The film forming method involves adsorbing an aminosilane gas on a substrate with a recess, depositing a silicon oxide film by supplying an oxidizing gas, and modifying the film using a mixed gas of nitrogen and hydrogen. The deposition method utilizes a deposition apparatus with an antenna that creates an inductive magnetic field in a plasma processing region. This method includes several steps, such as supplying an ignition gas, forming plasma, and switching gases to create the desired film.
Career Highlights
Fukada is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing industry. His work focuses on enhancing film deposition techniques, which are crucial for the production of advanced electronic devices.
Collaborations
Fukada collaborates with notable colleagues, including Shigehiro Miura and Masato Yonezawa. Their combined expertise contributes to the innovative projects at Tokyo Electron Limited.
Conclusion
Takehiro Fukada's contributions to film forming and deposition methods highlight his role as a key innovator in the semiconductor industry. His patents reflect a commitment to advancing technology and improving manufacturing processes.