This inventor holds 6 USPTO granted patents. Top assignee: Fujitsu Corporation. Active years: 1987-2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1987-2003
Title: Takayoshi Matsuyama: Innovator in Pattern Inspection Technology
Introduction
Takayoshi Matsuyama is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of pattern inspection technology, holding a total of 6 patents. His work focuses on developing methods and apparatuses that enhance the efficiency and accuracy of pattern inspections.
Latest Patents
Matsuyama's latest patents include a pattern inspection method, a pattern inspection apparatus, and a recording medium that stores a pattern inspection program. These innovations provide a streamlined approach to pattern inspection using a simple mechanical apparatus and straightforward procedures. The pattern inspection apparatus features a first image data generator that creates first image data from a captured pattern image. Additionally, a second image data generator reduces the four sides of each pattern in the first image data. The apparatus also includes a pattern number detector that identifies both the first and second pattern numbers, as well as a defect detector that identifies defects in the sample patterns based on the comparison of these numbers.
Career Highlights
Matsuyama is currently employed at Fujitsu Corporation, where he continues to advance his research and development in pattern inspection technologies. His work has been instrumental in improving the reliability and effectiveness of inspection processes in various applications.
Collaborations
Some of his notable coworkers include Ken-ichi Kobayashi and Kenichi Kobayashi, who have collaborated with him on various projects within the field.
Conclusion
Takayoshi Matsuyama's contributions to pattern inspection technology exemplify his innovative spirit and dedication to enhancing industrial processes. His patents reflect a commitment to improving accuracy and efficiency in pattern inspections, making a lasting impact in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
