The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 05, 2003

Filed:

Mar. 14, 2000
Applicant:
Inventors:

Takayoshi Matsuyama, Kawasaki, JP;

Ituo Kobayashi, Kawasaki, JP;

Assignee:

Fujitsu Limited, Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 ; G03C 5/00 ;
U.S. Cl.
CPC ...
G06K 9/00 ; G03C 5/00 ;
Abstract

A pattern inspection method and apparatus for carrying out pattern inspection with a simple mechanical apparatus following a simple procedure are provided. A recording medium which records a pattern inspection program for carrying out the pattern inspection is also provided. The pattern inspection apparatus of the present invention includes: a first image data generator which generates first image data from a pattern image captured from a sample; a second image data generator which generates second image data by reducing the four sides of each pattern contained in the first image data; a pattern number detector which detects a first pattern number that is the number of patterns contained in the first image data, and also detects a second pattern number that is the number of patterns contained in the second image data; and a defect detector which detects a defect contained in the patterns of the sample in accordance with a result of the comparison between the first pattern number and the second pattern number.


Find Patent Forward Citations

Matsuyama, Takayoshi. (2003). Pattern inspection method, pattern inspection apparatus, and recording medium which records pattern inspection program (U.S. Patent No. 6603875). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6603875

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