Location History:
- Saitama, JA (1978)
- Sakura, JP (1985 - 1986)
- Tokyo, JP (1989 - 1999)
Company Filing History:
6 out of 9 
4 out of 4,979 
1 out of 1,430 
Years Active: 1978-1999
Title: The Innovations of Takateru Asano: A Pioneer in Photoresist Composition
Introduction: Takateru Asano, an accomplished inventor based in Tokyo, Japan, has made significant strides in the field of photoresist compositions. With a total of eight patents to his name, Asano's work is pivotal in advancing technologies used for producing refined electronic components, facilitating the evolution of modern electronics.
Latest Patents: Among his recent innovations, Takateru Asano has developed a water-soluble photoresist composition that comprises a photosensitive composition containing a casein component alongside a water-soluble photosensitive agent and at least one calcium salt of an organic acid. This innovative photoresist composition boasts excellent sensitivity, resolution, and etching resistance, marking it as a valuable resource in the production of advanced electronic components such as shadow masks and lead frames. Additionally, he has introduced a negative photoresist composition that includes a base resin of polyhydroxystyrene, a photosensitizer, and a solvent. This formulation features dry etching resistance characteristics that rival traditional positive novolak photoresist compositions, enabling the formation of resist patterns with high resolution and precise vertical sidewall profiles, thus making microprocessing achievable.
Career Highlights: Takateru Asano has held positions at notable companies, including Fuji Chemicals Industrial Co., Ltd. and Oki Electric Industry Co., Ltd. His contributions in these organizations reflect his commitment to advancing the field and his expertise in developing cutting-edge materials for electronic applications.
Collaborations: Throughout his career, Asano has collaborated with esteemed colleagues, notably Yoshio Yamashita and Kenji Kobayashi. These collaborations have enriched his work and fostered an environment of innovation, driving forward the capabilities in the realm of photoresist materials.
Conclusion: Takateru Asano stands as a remarkable figure in the landscape of modern electronics. Through his extensive portfolio of patents and his collaborations with other talented professionals, he continues to influence the industry and push the boundaries of innovation in photoresist application technologies. His work not only highlights his individual prowess but also the importance of teamwork and collaboration in achieving groundbreaking results in the field.