The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 1989
Filed:
Aug. 19, 1988
Toshio Ito, Tokyo, JP;
Miwa Sakata, Tokyo, JP;
Yoshio Yamashita, Tokyo, JP;
Takateru Asano, Tokyo, JP;
Kenji Kobayashi, Tokyo, JP;
Oki Electric Industry Co., Ltd., Tokyo, JP;
Fuji Chemicals Industrial Co., Ltd., Tokyo, JP;
Abstract
A pattern-forming material is made by halogenoacetylation of the hydroxyl group of the copolymer of hydroxystyrene, and methyl methacrylate or ethyl methacrylate copolymer. The pattern-forming material in this invention is based on a resin copolymer of hydroxystyrene which has excellent dry etching resistance properties and methyl methacrylate or hydroxy ethyl methacrylate which is transparent to deep UV radiation over a relatively wide spectral range, combined with halogenoacetyl groups as photoreactive groups. Further, as the pattern-forming materials of this invention are soluble in the various liquids described below, a resist solution can easily be prepared, and a film of the material can easily be formed by the spin coating process.