The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 24, 1985

Filed:

Jun. 11, 1984
Applicant:
Inventors:

Taichi Ichihashi, Osaka, JP;

Wasaburo Kawai, Kawanishi, JP;

Tadashi Naraoka, Takaishi, JP;

Takateru Asano, Sakura, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ; C08F / ; C08F / ;
U.S. Cl.
CPC ...
430280 ; 526273 ; 5263077 ; 20415914 ; 430285 ; 430287 ;
Abstract

A photosensitive high polymer which is a random copolymer comprising a structural unit represented by the formula ##STR1## wherein A is ##STR2## wherein R is hydrogen, methyl or methoxy and a structural unit represented by the formula ##STR3## the polymer containing about 5 to about 80 mole % of structural units of the formula (I) and having a polymerization degree of about 300 to about 3000, a process for preparing the photosensitive high polymer and a composition comprising the photosensitive high polymer and solvent.


Find Patent Forward Citations

Ichihashi, Taichi. (1985). Photosensitive high polymer, easily insolubilized when cross-linked by (U.S. Patent No. 4560640). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4560640

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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