Tokyo, Japan

Takashi Yoda

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Ebara Corporation. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takashi Yoda. Retrieved from https://idiyas.com/inventor/takashi-yoda-heuj985d

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Takashi Yoda: Innovator in Polishing Technology

Introduction

Takashi Yoda is a prominent inventor based in Tokyo, Japan. He is known for his innovative contributions to polishing technology, particularly in the development of a specialized dresser for polishing cloths. His work has significantly impacted the efficiency and effectiveness of polishing operations.

Latest Patents

Takashi Yoda holds a patent for a "Dresser for polishing cloth and method for manufacturing such dresser and polishing apparatus." This invention provides an improved dresser that enhances the polishing surface while ensuring that the object being polished is not scratched. The design includes a number of spired projections formed on a metallic substrate, along with a wear-resistant hard film that is applied to enhance durability.

Career Highlights

Yoda is currently employed at Ebara Corporation, a leading company in the field of manufacturing and technology. His role involves the application of his patented technology to improve polishing processes and equipment.

Collaborations

Some of his notable coworkers include Hiroshi Nagasaka and Momoko Kakutani, who contribute to the innovative environment at Ebara Corporation.

Conclusion

Takashi Yoda's contributions to polishing technology exemplify the importance of innovation in manufacturing processes. His patented inventions continue to influence the industry, ensuring high-quality results in polishing applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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