Kikuchi-gun, Japan

Takashi Sakaue

USPTO Granted Patents = 2 

Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Kikuchi-gun, JP (2017)
  • Kumamoto, JP (2017)

Company Filing History:


Years Active: 2017

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Takashi Sakaue

Introduction

Takashi Sakaue is a notable inventor based in Kikuchi-gun, Japan. He has made significant contributions to the field of technology, particularly in the area of substrate processing. With a total of 2 patents to his name, Sakaue's work has had a considerable impact on the industry.

Latest Patents

Sakaue's latest patents include a delamination method, delamination device, and delamination system. This delamination method is designed for separating a laminated substrate that consists of a first and a second substrate bonded together. The process involves adjusting the position of the laminated substrate at a holding unit, detecting contact with a sharp member, and utilizing suction movement units to effectively delaminate the second substrate from the first. Additionally, he has developed a cleaning device, peeling system, cleaning method, and computer-readable storage medium. This cleaning method focuses on peeling off an overlapped substrate and cleaning the bonding surface of the peeled substrate, ensuring efficient processing.

Career Highlights

Takashi Sakaue is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics industry. His work at the company has allowed him to further innovate and refine his inventions, contributing to advancements in technology.

Collaborations

Throughout his career, Sakaue has collaborated with talented individuals such as Masanori Itou and Ryoichi Sakamoto. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

In summary, Takashi Sakaue is a distinguished inventor whose work in delamination methods and cleaning technologies has made a significant impact in the field. His contributions continue to influence advancements in substrate processing and technology.

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